Not known Facts About Noohapou
Not known Facts About Noohapou
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Remote destinations: Static units are generally positioned remotely, increasing Charge and decreasing overall process effectiveness.
Device & TCU software package calibration procedures vary exterior examination equipment not employed regularly for verifying
the data underneath is categorized by semiconductor system and Software maker. Each and every table features an purposes Matrix that exhibits qulified and industrial processes.
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This outstanding method, giving a small variety aspect, low price-of-Ownership and Dynamic Temperature Control made available procedure and products engineers a new Software to enhance their temperature sensitive processes.
The precision of your POU 3300 permits unbiased Charge of the procedure fluid temperature to your wafer chuck inside of +/- 0.1 °C of established level, along with the quickly response time from the procedure lets for max wafer-to-wafer repeatability through the etch course of action.
The precision with the POU 3500 permits impartial control of the method fluid temperature for the wafer chuck within +/- 0.1 °C of established place, along with the rapidly response time of your program allows for maximum wafer-to-wafer repeatability through the entire etch method.
Along with the POU3300, you may realize unprecedented ends in etch effectiveness, chamber uptime, decreased expense of possession and fab space utilization – all even though bettering your system trustworthiness.
the info pertains to some 300mm chamber temperature profile in the course of a superior facet ratio Etch course of action, running at incredibly large RF electrical power conditions (~3.8kW). The compelling facets of this facts established are:
Dynamic Temperature Regulate, as carried here out in methods much like the LAUDA-Noah POU, is really an approach that senses the temperature of the method fluid getting back from the method chamber’s wafer chuck (ESC) and dynamically adjusts the temperature from the equipped course of action fluid based on this actual-time suggestions.
the information established Here's from the 200mm quantity creation wafer fab and Obviously illustrates the benefit of the LAUDA-Noah POU system.
The POU3300 procedure delivers dynamic temperature control of the process chamber cathode / electrode / anode and can be synchronized with any etch course of action.
Confirmed; TEs' represent just one part of a chiller's structure. The switching & Command procedures employed by a chiller will affect the TEs' trustworthiness.
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